Investigation of the chemical residuals on the fused silica during chemical mechanical polishing
Article
Article Title | Investigation of the chemical residuals on the fused silica during chemical mechanical polishing |
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ERA Journal ID | 210250 |
Article Category | Article |
Authors | Xu, Li (Author), Chen, Gaopan (Author), Luo, Haimei (Author), Shi, Xiao-Lei (Author), Luo, Guihai (Author) and Pan, Guoshun (Author) |
Journal Title | Chemistry Select |
Journal Citation | 3 (31), pp. 8930-8935 |
Number of Pages | 5 |
Year | 2018 |
Publisher | John Wiley & Sons |
Place of Publication | Germany |
ISSN | 2365-6549 |
Digital Object Identifier (DOI) | https://doi.org/10.1002/slct.201801163 |
Web Address (URL) | https://chemistry-europe.onlinelibrary.wiley.com/doi/10.1002/slct.201801163 |
Abstract | Chemical residuals on fused silica after chemical mechanical polishing with silica and ceria have been analyzed. The surface of fused silica terminates with silanol after being polished with silica abrasives but ends up with Ce‐O−Si in a ceria‐based slurry under the CMP environment. The silanol firstly synthesizes on a fused silica surface polished with ceria, but then further reacts with hydroxyl cerium groups scattering in the slurry forming Ce‐O−Si. It also reveals that polishing fused silica with silica abrasives is an alternative way giving an ultra smooth surface. |
Keywords | Fused silica; Chemical Mechanical Polishing; Chemical Products; Material Removal Mechanism |
ANZSRC Field of Research 2020 | 401605. Functional materials |
Public Notes | Files associated with this item cannot be displayed due to copyright restrictions. |
Byline Affiliations | Tsinghua University, China |
Shenzhen University, China | |
Centre for Future Materials | |
Institution of Origin | University of Southern Queensland |
https://research.usq.edu.au/item/q5w0z/investigation-of-the-chemical-residuals-on-the-fused-silica-during-chemical-mechanical-polishing
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