Realization of atomic-level smooth surface of sapphire (0001) by chemical-mechanical planarization with nano colloidal silica abrasives
Paper
Paper/Presentation Title | Realization of atomic-level smooth surface of sapphire (0001) by chemical-mechanical planarization with nano colloidal silica abrasives |
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Presentation Type | Paper |
Authors | Shi, Xiaolei (Author), Pan, Guoshun (Author), Zhou, Yan (Author) and Liu, Yuhong (Author) |
Journal or Proceedings Title | Proceedings of the 11th International Conference on Planarization/CMP Technology (ICPT 2014) |
Number of Pages | 4 |
Year | 2015 |
Place of Publication | Piscataway, United States |
ISBN | 9781479955565 |
9781479955572 | |
Digital Object Identifier (DOI) | https://doi.org/10.1109/ICPT.2014.7017292 |
Web Address (URL) of Paper | https://ieeexplore.ieee.org/document/7017292 |
Conference/Event | 11th International Conference on Planarization/CMP Technology (ICPT 2014) |
Event Details | 11th International Conference on Planarization/CMP Technology (ICPT 2014) Event Date 19 to end of 21 Nov 2014 Event Location Kobe, Japan |
Abstract | In this paper, an innovative study is presented to characterize the chemical-mechanical planarization (CMP) performance on hexagonal sapphire (0001) wafer surface by using colloidal silica (SiO 2 ) abrasives based slurry with two different particle sizes, which indicates that the value of abrasive size is an important factor to determine the efficiency of CMP and the final planarization quality of wafer surface. The nano SiO 2 abrasives used in this study could perfectly optimize the quality of surface roughness. Furthermore, the authors put forward some suggestions to optimize the CMP efficiency and planarization quality of sapphire wafer. |
Keywords | abrasives, rough surfaces, surface roughness, planarization, surface topography, slurries |
ANZSRC Field of Research 2020 | 401605. Functional materials |
Public Notes | Files associated with this item cannot be displayed due to copyright restrictions. |
Byline Affiliations | Tsinghua University, China |
Institution of Origin | University of Southern Queensland |
https://research.usq.edu.au/item/q5w1v/realization-of-atomic-level-smooth-surface-of-sapphire-0001-by-chemical-mechanical-planarization-with-nano-colloidal-silica-abrasives
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