Robust free-standing nano-thin SiC membranes enable direct photolithography for MEMS sensing applications
Article
Article Title | Robust free-standing nano-thin SiC membranes enable direct photolithography for MEMS sensing applications |
---|---|
ERA Journal ID | 4863 |
Article Category | Article |
Authors | Phan, Hoang-Phuong (Author), Nguyen, Tuan-Khoa (Author), Dinh, Toan (Author), Iacopi, Alan (Author), Hold, Leonie (Author), Shiddiky, Muhammad J. A. (Author), Dao, Dzung Viet (Author) and Nguyen, Nam-Trung (Author) |
Journal Title | Advanced Engineering Materials |
Journal Citation | 20 (1) |
Article Number | 1700858 |
Number of Pages | 5 |
Year | 2017 |
Place of Publication | Germany |
ISSN | 1438-1656 |
1527-2648 | |
Digital Object Identifier (DOI) | https://doi.org/10.1002/adem.201700858 |
Web Address (URL) | https://onlinelibrary.wiley.com/doi/epdf/10.1002/adem.201700858 |
Abstract | This work presents fabrication of micro structures on sub–100 nm SiC membranes with a large aspect ratio up to 1:3200. Unlike conventional processes, this approach starts with Si wet etching to form suspended SiC membranes, followed by micro‐machined processes to pattern free‐standing microstructures such as cantilevers and micro bridges. This technique eliminates the sticking or the under‐etching effects on free‐standing structures, enhancing mechanical performance which is favorable for MEMS applications. In addition, post‐Si‐etching photography also enables the formation of metal electrodes on free standing SiC membranes to develop electrically‐measurable devices. To proof this concept, the authors demonstrate a SiC pressure sensor by applying lithography and plasma etching on released ultrathin SiC films. The sensors exhibit excellent linear response to the applied pressure, as well as good repeatability. The proposed method opens a pathway for the development of self‐sensing free‐standing SiC sensors. |
Keywords | MEMS; photolithography process; pressure sensors; self-sensing devices; silicon carbide |
ANZSRC Field of Research 2020 | 401705. Microelectromechanical systems (MEMS) |
Public Notes | Files associated with this item cannot be displayed due to copyright restrictions. |
Byline Affiliations | Griffith University |
Institution of Origin | University of Southern Queensland |
https://research.usq.edu.au/item/q5q28/robust-free-standing-nano-thin-sic-membranes-enable-direct-photolithography-for-mems-sensing-applications
131
total views8
total downloads1
views this month0
downloads this month